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QUESTION:

What is Chemical Mechanical Planarization and how is it used in the fiber optic cable assembly process?

 

ANSWER: 

CMP flock pile pads provide two functions in the polishing process for MT ferrules:

  • The primary purpose is to etch away the thermoset or thermoplastic on the MT ferrule and leave the fibers at a specific, controllable protrusion.
  • The secondary purpose is to polish the fibers.

Most polishing films have a single purpose: they polish. For MT ferrules, the CMP process uses a flock pile pad to provide a hybrid of chemical etching and abrasive polishing.

This dual-purpose film achieves both etching and polishing by combining two forces: chemical and mechanical.

The mechanical forces are motion, pressure, and velocity of the substrate (in this case, the connector) across the CMP flock pile pad.

The flock pile pad is a nylon material secured to a base-film material such as poly-ethylene terephthalate. The individual piles (nylon fibers) range from .3 to .5 mm in length.

This allows the chemical to fully achieve a good coverage surface of the MT ferrule while enabling it to etch away the thermoset or thermoplastic to achieve a flat and even surface.

 

 

READ THE FULL BLOG ARTICLE HERE:  Using Chemical Mechanical Planarization (CMP) to polish MT ferrules and get repeatable, predictable results

 

 

  Answered by AskFOC Technical Team April 3, 2019

 

 

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Kathleen Skelton, as FOC's Director of Strategic Marketing, utilizes her expertise in business development, online strategy, market planning, digital best practices, standard operating procedure development, and content management. A graduate of Curry College, she holds degrees in Communications and Education, English and Psychology. Kathleen resides outside of Boston, MA with her husband and four children. Follow @KATHLEENSKELTON