QUESTION:   

How long has Chemical Mechanical Planarization (CMP) polishing process been used?

 

ANSWER: 

We have been watching the development of Chemical Mechanical Planarization (CMP) since the 1980s, when this polishing process was first used in the semiconductor industry. Of course, my interest in CMP became more personal when this process was introduced to the fiber optic industry in the early 1990s. Since then, CMP has become integral to manufacturing fiber optic cable assemblies with MT ferrules. In fact, we continue to see developments to the CMP process.

 

READ THE FULL BLOG ARTICLE HERE:  Using Chemical Mechanical Planarization (CMP) to polish MT ferrules and get repeatable, predictable results

 

 

ADDITIONAL CONTENT & RESOURCES:

 

 

 

  Answered by AskFOC Technical Team  February 20, 2019

 

 

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