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QUESTION:   

How long has Chemical Mechanical Planarization (CMP) polishing process been used?

 

ANSWER: 

We have been watching the development of Chemical Mechanical Planarization (CMP) since the 1980s, when this polishing process was first used in the semiconductor industry. Of course, my interest in CMP became more personal when this process was introduced to the fiber optic industry in the early 1990s. Since then, CMP has become integral to manufacturing fiber optic cable assemblies with MT ferrules. In fact, we continue to see developments to the CMP process.

 

READ THE FULL BLOG ARTICLE HERE:  Using Chemical Mechanical Planarization (CMP) to polish MT ferrules and get repeatable, predictable results

 

 

  Answered by AskFOC Technical Team  February 20, 2019

 

 

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About Kathleen Skelton

Kathleen Skelton, as FOC's Director of Strategic Marketing, utilizes her expertise in business development, online strategy, market planning, digital best practices, standard operating procedure development, and content management. A graduate of Curry College, she holds degrees in Communications and Education, English and Psychology. Kathleen resides outside of Boston, MA with her husband and four children. Follow @KATHLEENSKELTON